Plasma Sources Science & Technology

Plasma Sources Science & Technology

等离子源科技

  • 2区 中科院分区
  • Q1 JCR分区

期刊简介

《Plasma Sources Science & Technology》是由IOP Publishing Ltd.出版社于1992年创办的英文国际期刊(ISSN: 0963-0252,E-ISSN: 1361-6595),该期刊长期致力于物理:流体与等离子体领域的创新研究,主要研究方向为物理-物理:流体与等离子体。作为SCIE收录期刊(JCR分区 Q1,中科院 2区),本刊采用OA未开放获取模式(OA占比0.1047...%),以发表物理:流体与等离子体领域等方向的原创性研究为核心(研究类文章占比99.17%%)。凭借严格的同行评审与高效编辑流程,期刊年载文量精选控制在242篇,确保学术质量与前沿性。成果覆盖Web of Science、Scopus等国际权威数据库,为学者提供推动物理与天体物理领域高水平交流平台。

投稿咨询

投稿提示

Plasma Sources Science & Technology审稿周期约为 约6.0个月 。该刊近年未被列入国际预警名单,年发文量约242篇,录用竞争适中,主题需确保紧密契合物理与天体物理前沿。投稿策略提示:避开学术会议旺季投稿以缩短周期,语言建议专业润色提升可读性。

  • 物理与天体物理 大类学科
  • English 出版语言
  • 是否预警
  • SCIE 期刊收录
  • 242 发文量

中科院分区

中科院 SCI 期刊分区 2023年12月升级版

Top期刊 综述期刊 大类学科 小类学科
物理与天体物理
2区
PHYSICS, FLUIDS & PLASMAS 物理:流体与等离子体
1区

中科院 SCI 期刊分区 2022年12月升级版

Top期刊 综述期刊 大类学科 小类学科
物理与天体物理
1区
PHYSICS, FLUIDS & PLASMAS 物理:流体与等离子体
1区

JCR分区

按JIF指标学科分区 收录子集 分区 排名 百分位
学科:PHYSICS, FLUIDS & PLASMAS SCIE Q1 6 / 40

86.3%

按JCI指标学科分区 收录子集 分区 排名 百分位
学科:PHYSICS, FLUIDS & PLASMAS SCIE Q1 6 / 40

86.25%

CiteScore

CiteScore SJR SNIP CiteScore 排名
CiteScore:7.1 SJR:0.771 SNIP:1.373
学科类别 分区 排名 百分位
大类:Physics and Astronomy 小类:Condensed Matter Physics Q1 74 / 434

83%

期刊发文

  • Self-consistent treatment of gas heating in modeling of a coaxial DBD in atmospheric pressure CO2

    Author: Zhou, Chen; Yuan, Chengxun; Kudryavtsev, Anatoly; Yasar Katircioglu, T.; Rafatov, Ismail; Yao, Jingfeng

    Journal: PLASMA SOURCES SCIENCE & TECHNOLOGY. 2023; Vol. 32, Issue 1, pp. -. DOI: 10.1088/1361-6595/acb3f6

  • Streamer dynamics and periodical discharge regime transitions under repetitive nanosecond pulses with airflow

    Author: Zhao, Zheng; Li, Chenjie; Guo, Yulin; Zheng, Xinlei; Sun, Anbang; Li, Jiangtao

    Journal: PLASMA SOURCES SCIENCE & TECHNOLOGY. 2023; Vol. 32, Issue 1, pp. -. DOI: 10.1088/1361-6595/acacc5

  • Numerical simulation of gas breakdown characteristics in porous dielectric and theoretical analysis based on the capillary network model

    Author: Chen, Kai; Yao, Chenguo; Mao, Yilong; Wu, Feiyu; Chen, Yue; Dong, Shoulong; Wang, Hao

    Journal: PLASMA SOURCES SCIENCE & TECHNOLOGY. 2023; Vol. 32, Issue 1, pp. -. DOI: 10.1088/1361-6595/acad9e

  • In situ probing of atmospheric-pressure warm air glow discharge for nitrogen fixation by multiple laser spectroscopies

    Author: Shu, Zhan; Qiao, Junjie; Yang, Qi; Song, Yijia; Wang, Dazhi; Xiong, Qing

    Journal: PLASMA SOURCES SCIENCE & TECHNOLOGY. 2023; Vol. 32, Issue 2, pp. -. DOI: 10.1088/1361-6595/acb592

  • Impact of surface charges on energy deposition in surface dielectric barrier discharge: a modeling investigation

    Author: Ren, Chenhua; Huang, Bangdou; Zhang, Cheng; Qi, Bo; Chen, Weijiang; Shao, Tao

    Journal: PLASMA SOURCES SCIENCE & TECHNOLOGY. 2023; Vol. 32, Issue 2, pp. -. DOI: 10.1088/1361-6595/acb4b9

  • Local enhancement of electron heating and neutral species generation in radio-frequency micro-atmospheric pressure plasma jets: the effects of structured electrode topologies

    Author: Liu, Yue; Vass, Mate; Huebner, Gerrit; Schulenberg, David; Hemke, Torben; Bischoff, Lena; Chur, Sascha; Steuer, David; Golda, Judith; Boeke, Marc; Schulze, Julian; Korolov, Ihor; Mussenbrock, Thomas

    Journal: PLASMA SOURCES SCIENCE & TECHNOLOGY. 2023; Vol. 32, Issue 2, pp. -. DOI: 10.1088/1361-6595/acb9b8

  • Transition mechanisms between selective O-3 and NO (x) generation modes in atmospheric-pressure plasmas: decoupling specific discharge energy and gas temperature effects

    Author: Liu, Kun; Geng, Wenqiang; Zhou, Xiongfeng; Duan, Qingsong; Zheng, Zhenfeng; Ostrikov, Kostya (Ken)

    Journal: PLASMA SOURCES SCIENCE & TECHNOLOGY. 2023; Vol. 32, Issue 2, pp. -. DOI: 10.1088/1361-6595/acb814

  • Experimental study of the effect of dielectric materials on the decomposition of carbon dioxide in a dielectric barrier discharge

    Author: Liu, Chang-Yu; Wang, Hai-Xing; Wang, Chao; Meng, Xian; Huang, He-Ji; Cao, Jin-Wen; Sun, Su-Rong; Yan, Cong

    Journal: PLASMA SOURCES SCIENCE & TECHNOLOGY. 2023; Vol. 32, Issue 2, pp. -. DOI: 10.1088/1361-6595/acb816