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In-line metrology and inspection for hidden structure of lateral gate-all-around devices enabled by high voltage critical dimension scanning electron microscop
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Journal: JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3. 2026; Vol. 25, Issue 1, pp. -. DOI: 10.1117/1.JMM.25.1.014002
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Enhanced multipopulation GA-BBO with chaotic acceleration for digital lithography mask optimizatio
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Journal: JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3. 2026; Vol. 25, Issue 1, pp. -. DOI: 10.1117/1.JMM.25.1.013401
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Underpass fabrication between Si-based straight-line and arc-shaped open microchannel
Author: Ma, Tieying; Zhan, Rongbin; Feng, Guojin; Jiang, Yixin; Zhou, Jinzhu; Zhou, Weijian
Journal: JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3. 2025; Vol. 24, Issue 1, pp. -. DOI: 10.1117/1.JMM.24.1.013601
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Image denoising algorithm based on double branching for critical dimension scanning electron microscop
Author: Liu, Sa; Deng, Fuqin; Zhu, Yanan; Liu, Zhuming
Journal: JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3. 2025; Vol. 24, Issue 1, pp. -. DOI: 10.1117/1.JMM.24.1.014004
