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Investigation of trapping/de-trapping dynamics of surface states in AlGaN/GaN high-electron mobility transistors based on dual-gate structures
Author: Luan, Tiantian; Jiang, Qimeng; Huang, Sen; Wang, Xinhua; Jin, Hao; Guo, Fuqiang; Yao, Yixu; Fan, Jie; Yin, Haibo; Wei, Ke; Li, Yankui; Jiang, Haojie; Li, Junfeng; Liu, Xinyu
Journal: MICROELECTRONIC ENGINEERING. 2023; Vol. 269, Issue , pp. -. DOI: 10.1016/j.mee.2022.111916
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Soybean-based memristor for multilevel data storage and emulation of synaptic behavior
Author: Wang, Lu; Li, Wenhao; Wen, Dianzhong
Journal: MICROELECTRONIC ENGINEERING. 2023; Vol. 267, Issue , pp. -. DOI: 10.1016/j.mee.2022.111911
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La-doped BiFeO3 junction based random access multilevel nonvolatile memory
Author: Li, Dong; Zhu, Xiaodong; Wu, Yanan; Zhao, Jian; Zhang, Kaimin; Li, Rui; Hao, Danni; Ma, Yanqing; Moro, Ramiro; Ma, Lei
Journal: MICROELECTRONIC ENGINEERING. 2023; Vol. 267, Issue , pp. -. DOI: 10.1016/j.mee.2022.111908
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A dual-mass fully decoupled MEMS gyroscope with optimized structural design for minimizing mechanical quadrature coupling
Author: Wu, Zhongye; Feng, Ronghui; Sun, Chengliang; Wang, Peng; Wu, Guoqiang
Journal: MICROELECTRONIC ENGINEERING. 2023; Vol. 269, Issue , pp. -. DOI: 10.1016/j.mee.2022.111918
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Dynamical analysis, circuit implementation, and simultaneous application of a novel four-dimensional hyperchaotic system based on cosine functions
Author: Zhang, Jie; Hou, Jinyou; Xu, Longhao; Zhu, Xiaopeng; Xie, Qinggang
Journal: MICROELECTRONIC ENGINEERING. 2023; Vol. 271, Issue , pp. -. DOI: 10.1016/j.mee.2023.111939
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Machine learning algorithm for the structural design of MEMS resonators
Author: Gu, Liutao; Zhang, Weiping; Lu, Haolin; Wu, Yuting; Fan, Chongyang
Journal: MICROELECTRONIC ENGINEERING. 2023; Vol. 271, Issue , pp. -. DOI: 10.1016/j.mee.2023.111950
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The insight and evaluation of ultra-scaled sub-1 nm gate length transistors
Author: Tian, He; Shen, Yang; Yan, Zhaoyi; Liu, Yanming; Wu, Fan; Ren, Tian-Ling
Journal: MICROELECTRONIC ENGINEERING. 2023; Vol. 273, Issue , pp. -. DOI: 10.1016/j.mee.2023.111963
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Simulation study of zone-height limit by electron beam lithography for 30 nm Fresnel zone plates in X ray optics
Author: Chen, Qiucheng; Mu, Chengyang; Tong, Xujie; Zhao, Jun; Wu, Qingxin; Chen, Yifang
Journal: MICROELECTRONIC ENGINEERING. 2023; Vol. 273, Issue , pp. -. DOI: 10.1016/j.mee.2023.111965