Ieee Journal Of The Electron Devices Society

Ieee Journal Of The Electron Devices Society

IEEE电子器件学会杂志

  • 3区 中科院分区
  • Q3 JCR分区

期刊简介

《Ieee Journal Of The Electron Devices Society》是由Institute of Electrical and Electronics Engineers Inc.出版社于2013年创办的英文国际期刊(ISSN: 2168-6734,E-ISSN: 2168-6734),该期刊长期致力于工程:电子与电气领域的创新研究,主要研究方向为Biochemistry, Genetics and Molecular Biology-Biotechnology。作为SCIE收录期刊(JCR分区 Q3,中科院 3区),本刊采用OA开放获取模式(OA占比1%),以发表工程:电子与电气领域等方向的原创性研究为核心(研究类文章占比98.91%%)。凭借严格的同行评审与高效编辑流程,期刊年载文量精选控制在92篇,确保学术质量与前沿性。成果覆盖Web of Science、Scopus等国际权威数据库,为学者提供推动工程技术领域高水平交流平台。

投稿咨询

投稿提示

Ieee Journal Of The Electron Devices Society审稿周期约为 9 Weeks 。该刊近年未被列入国际预警名单,年发文量约92篇,录用竞争适中,主题需确保紧密契合工程技术前沿。投稿策略提示:避开学术会议旺季投稿以缩短周期,语言建议专业润色提升可读性。

  • 工程技术 大类学科
  • English 出版语言
  • 是否预警
  • SCIE 期刊收录
  • 92 发文量

中科院分区

中科院 SCI 期刊分区 2023年12月升级版

Top期刊 综述期刊 大类学科 小类学科
工程技术
3区
ENGINEERING, ELECTRICAL & ELECTRONIC 工程:电子与电气
4区

中科院 SCI 期刊分区 2022年12月升级版

Top期刊 综述期刊 大类学科 小类学科
工程技术
3区
ENGINEERING, ELECTRICAL & ELECTRONIC 工程:电子与电气
3区

JCR分区

按JIF指标学科分区 收录子集 分区 排名 百分位
学科:ENGINEERING, ELECTRICAL & ELECTRONIC SCIE Q3 202 / 352

42.8%

按JCI指标学科分区 收录子集 分区 排名 百分位
学科:ENGINEERING, ELECTRICAL & ELECTRONIC SCIE Q3 179 / 354

49.58%

CiteScore

CiteScore SJR SNIP CiteScore 排名
CiteScore:5.2 SJR:0.505 SNIP:0.955
学科类别 分区 排名 百分位
大类:Materials Science 小类:Electronic, Optical and Magnetic Materials Q2 90 / 284

68%

大类:Materials Science 小类:Electrical and Electronic Engineering Q2 253 / 797

68%

大类:Materials Science 小类:Biotechnology Q2 139 / 311

55%

期刊发文

  • Monolithic Dual-Gate E-Mode Device-Based NAND Logic Block for GaN MIS-HEMTs IC Platform

    Author: Zhu, Yuhao; Li, Fan; Cui, Miao; Fang, Zhicheng; Li, Ang; Yang, Dongyi; Zhao, Yinchao; Wen, Huiqing; Liu, Wen

    Journal: IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY. 2023; Vol. 11, Issue , pp. 230-234. DOI: 10.1109/JEDS.2023.3265372

  • New Insights Into Noise Characteristics of Hot Carrier Induced Defects in Polysilicon Emitter Bipolar Junction Transistors and SiGe HBTs

    Author: Zhu, Kunfeng; Zhang, Peijian; Xu, Zicheng; Wang, Tao; Yi, Xiaohui; Hong, Min; Yang, Yonghui; Zhang, Guangsheng; Liu, Jian; Wei, Jianan; Pu, Yang; Huang, Dong; Luo, Ting; Chen, Xian; Tang, Xinyue; Tan, Kaizhou; Chen, Wensuo

    Journal: IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY. 2023; Vol. 11, Issue , pp. 30-35. DOI: 10.1109/JEDS.2023.3239341

  • Cell Design Consideration in SiC Planar IGBT and Proposal of New SiC IGBT With Improved Performance Trade-Off

    Author: Zhang, Meng; Zhang, Yamin; Li, Baikui; Feng, Shiwei; Hua, Mengyuan; Tang, Xi; Wei, Jin; Chen, Kevin J.

    Journal: IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY. 2023; Vol. 11, Issue , pp. 198-203. DOI: 10.1109/JEDS.2023.3259639

  • Impact of Channel Thickness on the NBTI Behaviors in the Ge-OI pMOSFETs With Al2O3/GeOx Gate Stacks

    Author: Sun, Yu; Schwarzenbach, Walter; Yuan, Sicong; Chen, Zhuo; Yang, Yanbin; Nguyen, Bich-Yen; Gao, Dawei; Zhang, Rui

    Journal: IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY. 2023; Vol. 11, Issue , pp. 210-215. DOI: 10.1109/JEDS.2023.3260978

  • Effect of Amorphous Layer at the Heterogeneous Interface on the Device Performance of beta-Ga2O3/Si Schottky Barrier Diodes

    Author: Qu, Zhenyu; Xu, Wenhui; You, Tiangui; Shen, Zhenghao; Zhao, Tiancheng; Huang, Kai; Yi, Ailun; Zhang, David Wei; Han, Genquan; Ou, Xin; Hao, Yue

    Journal: IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY. 2023; Vol. 11, Issue , pp. 135-140. DOI: 10.1109/JEDS.2023.3242968

  • Novel Stacked Passivation Structure for AlGaN/GaN HEMTs on Silicon With High Johnson's Figures of Merit

    Author: Liu, Xiaoyi; Qin, Jian; Chen, Jingxiong; Chen, Jianyu; Wang, Hong

    Journal: IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY. 2023; Vol. 11, Issue , pp. 130-134. DOI: 10.1109/JEDS.2023.3241306

  • RF Overdrive Burnout Behavior and Mechanism Analysis of GaN HEMTs Based on High Speed Camera

    Author: Liu, Chang; Liu, Hong Xia; Chen, Yi Qiang; Shi, Yi Jun; Xie, Yu Han; Chen, Si; Lai, Ping; He, Zhi Yuan; Huang, Yun

    Journal: IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY. 2023; Vol. 11, Issue , pp. 47-53. DOI: 10.1109/JEDS.2023.3239100

  • Current Prospects and Challenges in Negative-Capacitance Field-Effect Transistors

    Author: Islam, Md. Sherajul; Mazumder, Abdullah Al Mamun; Zhou, Changjian; Stampfl, Catherine; Park, Jeongwon; Yang, Cary Y. Y.

    Journal: IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY. 2023; Vol. 11, Issue , pp. 235-247. DOI: 10.1109/JEDS.2023.3267081