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Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuratio
Author: Wu, Xiaojian; Dong, Shuo; Xu, Kaidong; Zhuang, Shiwei
Journal: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2026; Vol. 44, Issue 3, pp. -. DOI: 10.1116/6.0005220
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Dual-gate Hf-doped InZnO field-effect transistors with sub-0.1 V threshold voltage shift under bias stres
Author: Li, Tiaoyang; Hu, Rongling
Journal: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2026; Vol. 44, Issue 3, pp. -. DOI: 10.1116/6.0005363
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Multiphysics simulation of non-uniform magnetic fields' effect on plasma uniformity in capacitively coupled plasma
Author: Cui, Yu-Meng; Liu, Ze-Xuan; Zhang, Si-Bo; Chen, Long; Zhang, Quan-Zhi
Journal: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2026; Vol. 44, Issue 3, pp. -. DOI: 10.1116/6.0005370
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Parametric study and performance evaluation of the louver structure in the pumping pipeline of electron beam evaporation coating equipmen
Author: Yuan, Zuhao; Li, Yong; She, Pengcheng; Gong, Jun; Shi, Renping; He, Qiufu; Liu, Fangting; Li, Junhui
Journal: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2026; Vol. 44, Issue 3, pp. -. DOI: 10.1116/6.0005283
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Ag-doping induced enhancement in power factor of flexible n-type Bi2Te2.7Se0.3 thin film
Author: Tian, Xujiang; Wu, Chonghao; Ma, Congming; Liang, Shaojun; Zhu, Hanming; Yue, Song
Journal: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2026; Vol. 44, Issue 3, pp. -. DOI: 10.1116/6.0005314
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Study on the imaging of bright-field and dark-field for contact holes in extreme ultraviolet lithography considering stage vibration effect
Author: Shen, Hao; Zhang, Libin; Wang, Jiashuo; Rui, Dinghai; Su, Yajuan; Wei, Yayi
Journal: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2026; Vol. 44, Issue 3, pp. -. DOI: 10.1116/6.0005261
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Optimization of key process parameters for cobalt sputtering in 0.11 μm CMOS device
Author: Wang, Furong; Xu, Shaohui; Song, Zhenhua; Zhang, Yan; Zhou, Yaohui; Li, Mincheng
Journal: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2026; Vol. 44, Issue 2, pp. -. DOI: 10.1116/6.0005238
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Simulation and deposition experimental study of a microwave plasma chemical vapor deposition device with an oblique cone structure desig
Author: Hu, Jibo; Zhu, Xiaoxiang; Zhao, Shusen; Wang, Huibin; Zhao, Yapei
Journal: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2026; Vol. 44, Issue 2, pp. -. DOI: 10.1116/6.0004980
