Semiconductor Science And Technology

Semiconductor Science And Technology

半导体科技

  • 4区 中科院分区
  • Q3 JCR分区

期刊简介

《Semiconductor Science And Technology》是由IOP Publishing Ltd.出版社于1986年创办的英文国际期刊(ISSN: 0268-1242,E-ISSN: 1361-6641),该期刊长期致力于工程:电子与电气领域的创新研究,主要研究方向为工程技术-材料科学:综合。作为SCIE收录期刊(JCR分区 Q3,中科院 4区),本刊采用OA未开放获取模式(OA占比0.0493...%),以发表工程:电子与电气领域等方向的原创性研究为核心(研究类文章占比95.85%%)。凭借严格的同行评审与高效编辑流程,期刊年载文量精选控制在193篇,确保学术质量与前沿性。成果覆盖Web of Science、Scopus等国际权威数据库,为学者提供推动工程技术领域高水平交流平台。

投稿咨询

投稿提示

Semiconductor Science And Technology审稿周期约为 一般,3-6周 。该刊近年未被列入国际预警名单,年发文量约193篇,录用竞争适中,主题需确保紧密契合工程技术前沿。投稿策略提示:避开学术会议旺季投稿以缩短周期,语言建议专业润色提升可读性。

  • 工程技术 大类学科
  • English 出版语言
  • 是否预警
  • SCIE 期刊收录
  • 193 发文量

中科院分区

中科院 SCI 期刊分区 2023年12月升级版

Top期刊 综述期刊 大类学科 小类学科
工程技术
4区
ENGINEERING, ELECTRICAL & ELECTRONIC 工程:电子与电气 MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合 PHYSICS, CONDENSED MATTER 物理:凝聚态物理
4区 4区 4区

中科院 SCI 期刊分区 2022年12月升级版

Top期刊 综述期刊 大类学科 小类学科
工程技术
4区
ENGINEERING, ELECTRICAL & ELECTRONIC 工程:电子与电气 MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合 PHYSICS, CONDENSED MATTER 物理:凝聚态物理
4区 4区 4区

JCR分区

按JIF指标学科分区 收录子集 分区 排名 百分位
学科:ENGINEERING, ELECTRICAL & ELECTRONIC SCIE Q3 211 / 352

40.2%

学科:MATERIALS SCIENCE, MULTIDISCIPLINARY SCIE Q3 301 / 438

31.4%

学科:PHYSICS, CONDENSED MATTER SCIE Q3 50 / 79

37.3%

按JCI指标学科分区 收录子集 分区 排名 百分位
学科:ENGINEERING, ELECTRICAL & ELECTRONIC SCIE Q3 238 / 354

32.91%

学科:MATERIALS SCIENCE, MULTIDISCIPLINARY SCIE Q3 293 / 438

33.22%

学科:PHYSICS, CONDENSED MATTER SCIE Q3 51 / 79

36.08%

CiteScore

CiteScore SJR SNIP CiteScore 排名
CiteScore:4.3 SJR:0.411 SNIP:0.741
学科类别 分区 排名 百分位
大类:Engineering 小类:Electrical and Electronic Engineering Q2 305 / 797

61%

大类:Engineering 小类:Condensed Matter Physics Q2 167 / 434

61%

大类:Engineering 小类:Materials Chemistry Q2 137 / 317

56%

大类:Engineering 小类:Electronic, Optical and Magnetic Materials Q2 126 / 284

55%

期刊发文

  • Sub-band gap infrared absorption in Si implanted with Mg

    Author: Wang, Mao; Shaikh, M. S.; Kentsch, U.; Heller, R.; Zhou, Shengqiang

    Journal: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. 2023; Vol. 38, Issue 1, pp. -. DOI: 10.1088/1361-6641/aca3ca

  • Emission and capture characteristics of electron trap (E-emi=0.8 eV) in Si-doped beta-Ga2O3 epilayer

    Author: Qu, Haolan; Chen, Jiaxiang; Zhang, Yu; Sui, Jin; Gu, Yitian; Deng, Yuxin; Su, Danni; Zhang, Ruohan; Lu, Xing; Zou, Xinbo

    Journal: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. 2023; Vol. 38, Issue 1, pp. -. DOI: 10.1088/1361-6641/aca045

  • Straightforward synthesis and mechanism insight of TiO2/a'-AgVO3 heterostructure with enhanced photocatalytic activity

    Author: Liu, Yangbin; Liu, Nian; Lin, Minghua; Zhou, Yun; Ouyang, Xiaoping

    Journal: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. 2023; Vol. 38, Issue 1, pp. -. DOI: 10.1088/1361-6641/aca625

  • The interplay of process parameters and influence on the AlN films on sapphire fabricated by DC magnetron sputtering and annealing

    Author: Liu, Huan; Guo, Wei

    Journal: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. 2023; Vol. 38, Issue 1, pp. -. DOI: 10.1088/1361-6641/aca8ca

  • Low-temperature in situ deposited CuI-based hole-transporter for perovskite solar cells efficiency enhancement

    Author: Li, Hang; Fu, Chao; Shi, Lei; Li, Chaorong; Pan, Jiaqi; Zhang, Wenjun

    Journal: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. 2023; Vol. 38, Issue 1, pp. -. DOI: 10.1088/1361-6641/aca3c9

  • Design of the GaN based CAVET with SiO2-InGaN hybrid current blocking layer

    Author: Li, Haiou; Kang, Dongxu; Qu, Kangchun; Liu, Xingpeng; Wan, Rongqiao

    Journal: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. 2023; Vol. 38, Issue 1, pp. -. DOI: 10.1088/1361-6641/aca626

  • In-situ deposition of tungsten oxide hole-contact by Hot-Wire CVD and its application in dopant-free heterojunction solar cells

    Author: Guo, Cong; Li, Junjun; Liu, Run; Zhang, Dongdong; Qiu, Junyang; Zhuang, Zihan; Chen, Yang; Qiu, Qingqing; Liu, Wenzhu; Huang, Yuelong; Yu, Jian; Chen, Tao

    Journal: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. 2023; Vol. 38, Issue 1, pp. -. DOI: 10.1088/1361-6641/aca5ac

  • Investigation of thermal stability and crystallization mechanism of Er-0.03(GeTe)(0.97) phase change material

    Author: Gu, Han; Wu, Weihua; Xu, Shengqing; Zhou, Xiaochen; Shen, Bo; Zhai, Jiwei

    Journal: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. 2023; Vol. 38, Issue 1, pp. -. DOI: 10.1088/1361-6641/aca520